Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation

被引:0
|
作者
Costello, S. [1 ]
Strusevich, N. [2 ]
Flynn, D. [1 ]
Kay, R. W. [1 ]
Patel, M. K. [2 ]
Bailey, C. [2 ]
Price, D. [3 ]
Bennet, M. [4 ]
Jones, A. C. [4 ]
Desmulliez, M. P. Y. [1 ]
机构
[1] Heriot Watt Univ, MIcroSyst Engn Ctr MISEC, Sch Engn & Phys Sci, Edinburgh EH14 4AS, Midlothian, Scotland
[2] Univ Greenwich, Sch Comp & Math Sci, Old Royal Naval Coll, London SE109LS, England
[3] Merlin Circuit Technol Ltd, Deeside CH53QZ, Clwyd, Wales
[4] Univ Edinburgh, Sch Chem, Edinburgh EH93JF, Midlothian, Scotland
基金
英国工程与自然科学研究理事会;
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the use of micro-particle imaging velocimetry (micro-PIV) to analyse fluid flow and hence ion replenishment in PCB micro-via during the electroplating process. Megasonic streaming is used to remove bubbles from blind micro-via and promote ion transportation within high aspect ratio PCB micro-via to enhance electrodeposition.
引用
收藏
页码:98 / 102
页数:5
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