Effect of film thickness on surface morphology and optical properties of Nanostructured Zinc Aluminum Oxide thin films deposited by DC Magnetron Sputtering

被引：0
|
作者：
Kumar, B. Rajesh [1 ]
Rao, T. Subba [1 ]
机构：
[1] Sri Krishnadevaraya Univ, Mat Res Lab, Dept Phys, Anantapur 515055, Andhra Pradesh, India
来源：
INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE & TECHNOLOGY | 2012年 / 1451卷
关键词：
Thin films; DC reactive magnetron sputtering; Surface morphology; Optical band gap;
D O I：
10.1063/1.4732414
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Nanostructured Zinc Aluminum Oxide thin films were deposited on glass substrates by DC reactive magnetron sputtering in an Ar + O-2 gas mixture using commercially available Zn metal (99.999% purity) and Al (99.99% purity) targets. Scanning Electron Microscope (SEM) images of Zinc Aluminum Oxide thin films shows that the grain sizes are in the range of 18-40 nm, while the optical transmittance is found to be dependent on film thickness. Optical constants such as absorption coefficient (alpha), extinction coefficient (k), and optical band gap (E-g) are evaluated from the transmission spectra.
引用
下载
收藏
页码：200 / 202
页数：3
相关论文
共 50 条
  • [21] Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering
    Araiza, Jose de Jesus
    Alvarez-Fraga, Leo
    Gago, Raul
    Sanchez, Olga
    [J]. MATERIALS, 2023, 16 (15)
  • [22] Structure Evolution of Zinc Oxide Thin Films Deposited by Unbalance DC Magnetron Sputtering
    Aryanto, Didik
    Marwoto, Putut
    Sudiro, Toto
    Birowosuto, Muhammad D.
    Sugianto
    Sulhadi
    [J]. INTERNATIONAL SYMPOSIUM ON CURRENT PROGRESS IN MATHEMATICS AND SCIENCES 2015 (ISCPMS 2015), 2016, 1729
  • [23] Electrical and optical properties of gallium-doped zinc oxide films deposited by dc magnetron sputtering
    Song, PK
    Watanabe, M
    Kon, M
    Mitsui, A
    Shigesato, Y
    [J]. THIN SOLID FILMS, 2002, 411 (01) : 82 - 86
  • [24] EFFECT OF POST ANNEALING ON SURFACE MORPHOLOGY, ELECTRICAL AND OPTICAL PROPERTIES OF DC REACTIVE MAGNETRON SPUTTERED ZINC ALUMINUM OXIDE THIN FILMS FOR OPTOELECTRONIC DEVICES
    Kumar, B. Rajesh
    Rao, T. Subba
    [J]. JOURNAL OF OVONIC RESEARCH, 2012, 8 (05): : 120 - 126
  • [25] Optical properties of ZnO thin films deposited by dc reactive magnetron sputtering
    Meng, Li-Jian
    Andritschky, M.
    dos Santos, M.P.
    [J]. Vacuum, 1993, 44 (02): : 105 - 109
  • [26] The electrical and optical properties of zinc oxide films deposited by DC sputtering
    Rakhesh, V.
    Vaidyan, V. K.
    [J]. OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2010, 4 (09): : 1321 - 1323
  • [27] Optical, electrical and structural properties of aluminum-doped nano-zinc oxide thin films deposited by magnetron sputtering
    Jin Hua Gu
    Lu Long
    Zhou Lu
    Zhi You Zhong
    [J]. Journal of Materials Science: Materials in Electronics, 2015, 26 : 734 - 741
  • [28] Optical, electrical and structural properties of aluminum-doped nano-zinc oxide thin films deposited by magnetron sputtering
    Gu, Jin Hua
    Long, Lu
    Lu, Zhou
    Zhong, Zhi You
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2015, 26 (02) : 734 - 741
  • [29] Effect of Film Thickness on Structural and Mechanical Properties of AlCrN Nanocompoite Thin Films Deposited by Reactive DC Magnetron Sputtering.
    Prakash, Ravi
    Kaur, Davider
    [J]. INTERNATIONAL CONFERENCE ON CONDENSED MATTER AND APPLIED PHYSICS (ICC 2015), 2016, 1728
  • [30] Electrical/optical properties of thin transparent oxide films deposited using DC magnetron sputtering.
    So, BS
    Kim, SM
    Pyo, YS
    Kim, YH
    Hwang, JH
    [J]. DESIGNING, PROCESSING AND PROPERTIES OF ADVANCED ENGINEERING MATERIALS, PTS 1 AND 2, 2004, 449-4 : 989 - 992
12345