Fabrication of submicron structures in nanoparticle/polymer composite by holographic lithography and reactive ion etching

被引：5

作者：

Zhang, A. Ping ^{[2
]}

He, Sailing ^{[2
]}

Kim, Kyoung Tae ^{[3
]}

Yoon, Yong-Kyu ^{[3
]}

Burzynski, Ryszard ^{[4
]}

Samoc, Marek ^{[1
,5
]}

Prasad, Paras N. ^{[1
]}

机构：

[1] SUNY Buffalo, Inst Lasers Photon & Biophoton, Buffalo, NY 14260 USA

[2] Zhejiang Univ, Dept Opt Engn, Ctr Opt & Electromagnet Res, Hangzhou 310058, Zhejiang, Peoples R China

[3] SUNY Buffalo, Dept Elect Engn, Buffalo, NY 14260 USA

[4] Laser Photon Technol Inc, Amherst, NY 14228 USA

[5] Australian Natl Univ, Laser Phys Ctr, Canberra, ACT 0200, Australia

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 20期

关键词：

holography; honeycomb structures; nanocomposites; nanotechnology; photolithography; polymerisation; silicon compounds; sputter etching;

D O I：

10.1063/1.2998541

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the fabrication of nanoparticle/polymer submicron structures by combining holographic lithography and reactive ion etching. Silica nanoparticles are uniformly dispersed in a (SU8) polymer matrix at a high concentration, and in situ polymerization (cross-linking) is used to form a nanoparticle/polymer composite. Another photosensitive SU8 layer cast upon the nanoparticle/SU8 composite layer is structured through holographic lithography, whose pattern is finally transferred to the nanoparticle/SU8 layer by the reactive ion etching process. Honeycomb structures in a submicron scale are experimentally realized in the nanoparticle/SU8 composite.

引用

页数：3

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