Electron emission from a heteroepitaxial diamond planar emitter

Heteroepitaxial diamond (100) with relatively smooth surface morphology is grown on iridium thin film by direct current plasma chemical vapor deposition, and its electron emission is discussed by comparing the electron emission of polycrystalline diamond with the various surface morphology. From the results of electron emission measurements, the emission property from heteroepitaxial diamond is independent of the measurement point, while that from polycrystalline diamond strongly depends on the measurement points. In addition, electron emission from heteroepitaxial diamond was observed at lower voltage compared to that from polycrystalline diamond.