Hall mobility in n-type 4H-Sic:: Calculation using hydrodynamic balance equations

被引:0
|
作者
Quan, HJ
Wang, BH [1 ]
Luo, XS
机构
[1] Univ Sci & Technol China, Dept Modern Phys, Hefei 230026, Peoples R China
[2] Univ Sci & Technol China, Ctr Nonlinear Sci, Hefei 230026, Peoples R China
[3] Shaoguan Univ, Dept Phys, Shaoguan 512005, Peoples R China
[4] CCAST, World Lab, Beijing 100080, Peoples R China
[5] Guangxi Normal Univ, Dept Phys & Elect Sci, Guilin 541004, Peoples R China
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2002年 / 16卷 / 03期
基金
中国国家自然科学基金;
关键词
D O I
10.1142/S0217979202008051
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Hall mobility in n-type 4H-SiC has been calculated by hydrodynamic balance equations for temperatures ranging from 30 to 1000 K. We employ a compensation model to analyze the carrier concentration versus temperature data. The results show that the neutral impurity scattering and the piezoelectric scattering do not make significant contribution to the electron mobility. The low-temperature value of the mobility is mainly due to the ionized impurity while the high-temperature tail is limited by acoustic, polar optical and intervalley optical lattice scatterings. These results are in good agreement with the experimental data.
引用
收藏
页码:463 / 471
页数:9
相关论文
共 50 条
  • [41] Quality and reliability of wet and dry oxides on n-type 4H-SiC
    Anthony, CJ
    Jones, AJ
    Uren, MJ
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 61-2 : 460 - 463
  • [42] Carrier transport mechanism of Al contacts on n-type 4H-SiC
    Kim, Seongjun
    Kim, Hong-Ki
    Jeong, Seonghoon
    Kang, Min-Jae
    Kang, Min-Sik
    Lee, Nam-Suk
    Tran Viet Cuong
    Koo, Sang-Mo
    Kim, Hyunsoo
    Shin, Hoon-Kyu
    MATERIALS LETTERS, 2018, 228 : 232 - 234
  • [43] Characterisation of Ni and Ni/Ti contact on n-type 4H-SiC
    Siad, M.
    Vargas, C. Pineda
    Nkosi, M.
    Saidi, D.
    Souami, N.
    Daas, N.
    Chami, A. C.
    APPLIED SURFACE SCIENCE, 2009, 256 (01) : 256 - 260
  • [44] IrO2 Schottky contact on n-type 4H-SiC
    Han, SY
    Jang, HW
    Lee, JL
    APPLIED PHYSICS LETTERS, 2003, 82 (26) : 4726 - 4728
  • [45] Low-dose n-type nitrogen implants in 4H-SiC
    Saks, NS
    Ryu, SH
    Suvorov, AV
    APPLIED PHYSICS LETTERS, 2002, 81 (26) : 4958 - 4960
  • [46] Residual stresses and stacking faults in n-type 4H-SiC epilayers
    Okojie, RS
    Zhang, M
    Pirouz, P
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 529 - 532
  • [47] Structural instability of 4H-SiC polytype induced by n-type doping
    Liu, JQ
    Chung, HJ
    Kuhr, T
    Li, Q
    Skowronski, M
    APPLIED PHYSICS LETTERS, 2002, 80 (12) : 2111 - 2113
  • [48] Deep Levels Generated by Thermal Oxidation in n-Type 4H-SiC
    Kawahara, Koutarou
    Suda, Jun
    Kimoto, Tsunenobu
    APPLIED PHYSICS EXPRESS, 2013, 6 (05)
  • [49] Nickel ohmic contacts to p- and n-type 4H-SiC
    Fursin, LG
    Zhao, JH
    Weiner, M
    ELECTRONICS LETTERS, 2001, 37 (17) : 1092 - 1093
  • [50] Microstructural interpretation of Ni ohmic contact on n-type 4H-SiC
    Han, SY
    Shin, JY
    Lee, BT
    Lee, JL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (04): : 1496 - 1500