New approach for the extraction of gate voltage dependent series resistance and channel length reduction in CMOS transistors

被引:3
|
作者
Brut, H
Juge, A
Ghibaudo, G
机构
关键词
D O I
10.1109/ICMTS.1997.589391
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The resistance based extraction method for the determination of effective channel length and series resistance behaviour with gate bias is critically analysed. The impossibility of extracting the gate voltage variations of these parameters concurrently is demonstrated. Then a new parameter extraction procedure is given and experimentally applied to a wide range of technologies, from 1.2 mu m down to 0.1 mu m. Finally, the lack of resolution in the determination of channel length. reduction and series resistance when the effective gate bias tends to zero and the impact of the substrate gate bias on these parameters is studied in detail.
引用
收藏
页码:188 / 193
页数:6
相关论文
共 50 条
  • [21] New method for temperature-dependent thermal resistance and capacitance accurate extraction in high-voltage DMOS transistors
    Anghel, C
    Hefyene, N
    Gillon, R
    Tack, M
    Declercq, MJ
    Ionescu, AM
    2003 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST, 2003, : 133 - 136
  • [22] MOSFET EFFECTIVE CHANNEL LENGTH, THRESHOLD VOLTAGE, AND SERIES RESISTANCE DETERMINATION BY ROBUST OPTIMIZATION
    MCANDREW, CC
    LAYMAN, PA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (10) : 2298 - 2311
  • [23] 2ND SUBSTRATE CURRENT PEAK AND ITS RELATIONSHIP TO GATE-VOLTAGE DEPENDENT SERIES RESISTANCE IN SUBMICROMETER NMOS LDD TRANSISTORS
    GUTIERREZ, EA
    DEFERM, L
    DECLERCK, G
    ELECTRONICS LETTERS, 1992, 28 (01) : 7 - 9
  • [24] TCAD Validation of an Intercept-at-Zero-Gate-Length MOSFET Series Resistance Extraction Method
    Takeuchi, Kiyoshi
    Mizutani, Tomoko
    Saraya, Takuya
    Kobayashi, Masaharu
    Hiramoto, Toshiro
    2021 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS (VLSI-TSA), 2021,
  • [25] Extraction of MOSFET threshold voltage, series resistance, effective channel length, and inversion layer mobility from small-signal channel conductance measurement
    Kong, FCJ
    Yeow, YT
    Yao, ZQ
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (12) : 2870 - 2874
  • [26] Series Resistance Extraction in Poly-Si TFTs With Channel Length and Mobility Variations
    Zhou, Yan
    Wang, Mingxiang
    Wong, Man
    IEEE ELECTRON DEVICE LETTERS, 2011, 32 (07) : 901 - 903
  • [27] A new method for the determination of the channel length reduction in polysilicon thin film transistors (TFTs)
    Farmakis, FV
    Brini, J
    Kamarinos, G
    Mathieu, N
    Dimitriadis, CA
    THIN SOLID FILMS, 1999, 337 (1-2) : 105 - 108
  • [28] Simple model for gate-voltage dependent parasitic resistance in short channel lightly doped drain metal oxide semiconductor field effect transistors
    Lee, Jung-Il
    Lee, Myung-Bok
    Lee, Sang Young
    Kang, Kwang Nham
    Yoon, Kyung Sik
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1991, 30 (04): : 535 - 537
  • [29] An Analytical MOSFET Model Including Gate Voltage Dependence of Channel Length Modulation Parameter for 20nm CMOS
    Hiroki, Akira
    Yamate, Akihiro
    Yamada, Masayoshi
    PROCEEDINGS OF ICECE 2008, VOLS 1 AND 2, 2008, : 139 - 143
  • [30] A NEW APPROACH TO DETERMINE THE EFFECTIVE CHANNEL-LENGTH AND THE DRAIN-AND-SOURCE SERIES RESISTANCE OF MINIATURIZED MOSFETS
    GUO, JC
    CHUNG, SSS
    HSU, CCH
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (10) : 1811 - 1818