Properties of Multilayered CrN/VN Films Prepared Using a Hybrid System of High-Power Impulse Magnetron Sputtering and Pulsed Magnetron Sputtering

被引：3
|
作者：
Kimura, Takashi [1 ]
Maeda, Hiroki [1 ]
机构：
[1] Nagoya Inst Technol, Grad Sch Engn, Nagoya, Aichi 4668555, Japan
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2023年 / 51卷 / 02期
基金：
日本学术振兴会;
关键词：
Magnetic multilayers; Sputtering; Substrates; X-ray scattering; Modulation; Metals; Magnetomechanical effects; Chromium nitride (CrN); high-power impulse magnetron sputtering; multilayer film; pulsed magnetron sputtering; vanadium nitride (VN); MECHANICAL-PROPERTIES; THERMAL-STABILITY; OXIDE FORMATION; COATINGS; WEAR; NANOCOMPOSITE; PERFORMANCE; FRICTION; BEHAVIOR; DESIGN;
D O I：
10.1109/TPS.2022.3175190
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Nanomultilayered chromium nitride (CrN)/ vanadium nitride (VN) films with different layer thicknesses were synthesized on Si substrates using a hybrid system of reactive high-power impulse magnetron sputtering (HiPIMS) and pulsed magnetron sputtering. The microstructure and properties of the nanomultilayered CrN/VN films were investigated using X-ray diffraction (XRD), transmission electron microscopy (TEM), the nanoindentation method, and the friction wear test. The XRD results showed that the multilayered films exhibited nanocrystallite structure with a (200) preferred orientation, and the estimated crystallite size was not highly dependent on the CrN and VN layer thicknesses. Inserting the VN layers decreased the compressive stress slightly compared to that of the CrN monolayer film and increased the hardness by 4-5 GPa compared to that of the CrN and VN monolayer films. The friction coefficient of the multilayered films strongly depended on the CrN layer thickness rather than on the VN layer thickness.
引用
收藏
页码：320 / 326
页数：7
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