Interface Design Development for Growing Short-Period InAs/GaSb Superlattices by Molecular-Beam Epitaxy

被引:2
|
作者
Krivobok, V. S. [1 ,2 ]
Pashkeev, D. A. [1 ]
Klekovkin, A. V. [1 ]
Minaev, I. I. [1 ]
Savin, K. A. [1 ]
Eroshenko, G. N. [1 ]
Goncharov, A. E. [1 ,2 ]
Nikolaev, S. N. [1 ]
机构
[1] Russian Acad Sci, Lebedev Phys Inst, Moscow 119991, Russia
[2] Orion R&D Co, Moscow 143090, Russia
关键词
type-II superlattice; molecular-beam epitaxy; reflection high-energy electron diffraction; atomic-force microscopy; X-ray diffraction analysis; OPTICAL-PROPERTIES; II SUPERLATTICE; MBE GROWTH; OPTIMIZATION; INAS;
D O I
10.3103/S1068335623090051
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The problems of growing short-period InAs/GaSb superlattices on GaSb (100) substrates by molecular-beam epitaxy are studied. For InAs/GaSb epitaxial heterostructures, a method for forming "InSb-like" atomically smooth interfaces with an ultrathin intermediate In(As)Sb layer is developed. This technique allowed growth of a short-period superlattice containing 50 InAs/GaSb periods. In situ growth control using high-energy electron diffraction and post-growth studies of the superlattice using atomic-force microscopy and X-ray diffraction confirm the efficiency of the technique for fabricating detector structures based on type-II superlattices.
引用
收藏
页码:396 / 402
页数:7
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