Thermal stability of MoNbTaTiW, MoNbTaVW and CrMoNbTaW thin films deposited by high power impulse magnetron sputtering

被引：8

作者：

Gruber, Georg C. ^{[1
]}

Lassnig, Alice ^{[2
]}

Zak, Stanislav ^{[2
]}

Gammer, Christoph ^{[2
]}

Cordill, Megan J. ^{[1
,2
]}

Franz, Robert ^{[1
]}

机构：

[1] Univ Leoben, Dept Mat Sci, A-8700 Leoben, Austria

[2] Austrian Acad Sci, Erich Schmid Inst Mat Sci, A-8700 Leoben, Austria

来源：

SURFACE & COATINGS TECHNOLOGY | 2023年 / 454卷

基金：

奥地利科学基金会;

关键词：

High entropy alloy; Refractory metal; MoNbTaW based; Thin film; High power impulse magnetron sputtering; Thermal stability; MECHANICAL-PROPERTIES;

D O I：

10.1016/j.surfcoat.2022.129189

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 degrees C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin2 psi method revealed a general reduction of the stress with annealing temperature due to defect annihilation.

引用

页数：7

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