Thermal stability of MoNbTaTiW, MoNbTaVW and CrMoNbTaW thin films deposited by high power impulse magnetron sputtering

被引：8
|
作者：
Gruber, Georg C. [1 ]
Lassnig, Alice [2 ]
Zak, Stanislav [2 ]
Gammer, Christoph [2 ]
Cordill, Megan J. [1 ,2 ]
Franz, Robert [1 ]
机构：
[1] Univ Leoben, Dept Mat Sci, A-8700 Leoben, Austria
[2] Austrian Acad Sci, Erich Schmid Inst Mat Sci, A-8700 Leoben, Austria
来源：
SURFACE & COATINGS TECHNOLOGY | 2023年 / 454卷
基金：
奥地利科学基金会;
关键词：
High entropy alloy; Refractory metal; MoNbTaW based; Thin film; High power impulse magnetron sputtering; Thermal stability; MECHANICAL-PROPERTIES;
D O I：
10.1016/j.surfcoat.2022.129189
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 degrees C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin2 psi method revealed a general reduction of the stress with annealing temperature due to defect annihilation.
引用
收藏
页数：7
相关论文
共 50 条
  • [41] Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique
    Liao, Bo-Huei
    Hsiao, Chien-Nan
    Shiao, Ming-Hua
    Chen, Sheng-Hui
    APPLIED OPTICS, 2020, 59 (05) : A176 - A180
  • [42] The adhesion and tribological properties of c-BN films deposited by high power impulse magnetron sputtering
    Efeoglu, Ihsan
    Totik, Yasar
    Keles, Aysenur
    Gulten, Gokhan
    Ersoy, Kivilcim
    Durkaya, Goksel
    CERAMICS INTERNATIONAL, 2019, 45 (03) : 3000 - 3006
  • [43] Research progress on preparation of amorphous carbon thin films by high power impulse magnetron sputtering
    Zuo, Xiao
    Sun, Li-Li
    Wang, Ai-Ying
    Ke, Pei-Ling
    Surface Technology, 2019, 48 (09): : 53 - 63
  • [44] Structure and Properties of Cr Films Deposited by High Power Impulse Magnetron Sputtering on Inner Surface of Tube
    Wu H.
    Tian X.
    Zheng L.
    Gong C.
    Zhang H.
    Zhongguo Biaomian Gongcheng/China Surface Engineering, 2022, 35 (05): : 210 - 216
  • [45] Thermal stability of tungsten nitride films deposited by reactive magnetron sputtering
    Mohamed, S. H.
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (10): : 2169 - 2175
  • [46] Stress profiles and thermal stability of CrxNy films deposited by magnetron sputtering
    Djouadi, MA
    Nouveau, C
    Banakh, O
    Sanjinés, R
    Lévy, F
    Nouet, G
    SURFACE & COATINGS TECHNOLOGY, 2002, 151 : 510 - 514
  • [47] Nitrogen doping of MoSx thin films sputtered by reactive High Power Impulse Magnetron Sputtering
    Tillmann, Wolfgang
    Wittig, Alexandra
    Moldenhauer, Henning
    Thomann, Carl-Arne
    Debus, Joerg
    Aurich, Daniel
    Bruemmer, Andreas
    THIN SOLID FILMS, 2020, 713
  • [48] Comparison of chromium nitride thin films deposited by reactive direct current magnetron sputtering and high power pulsed magnetron sputtering
    Li, Qian
    Li, Hua
    Wang, Zheng-Duo
    Zhang, Hai-Bao
    Yang, Li-Zhen
    Liu, Zhong-Wei
    Chen, Qiang
    Surface Technology, 2019, 48 (09): : 64 - 69
  • [49] Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
    Hajihoseini, Hamidreza
    Kateb, Movaffaq
    Ingvarsson, Snorri Porgeir
    Gudmundsson, Jon Tomas
    BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2019, 10 : 1914 - 1921
  • [50] Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering
    Moreira, Milena A.
    Torndahl, Tobias
    Katardjiev, Ilia
    Kubart, Tomas
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2015, 33 (02):
12345