PMMA based compound kinoform lenses for sub-150 nm hard x-rays focusing

It is the first time to fabricate the polymethyl methacrylate (PMMA) based compound kinoform lenses (CKLs) for nano-focusing of hard x-rays. The PMMA CKLs with a physical aperture of 160 mu m and a focal length of 20 mm are designed and fabricated by x-ray LIGA technology at the Beijing Synchrotron Radiation Facility. To improve the stiffness of the PMMA lines, PMMA sheets with high molecular weight are fabricated, and the results revealed that the PMMA lines with higher molecular weight were much stronger. After optimization, CKLs with the narrowest lines of 4 mu m width can achieve 110 mu m height and 2.99 nm surface roughness without deformation. The CKLs were tested at the Diamond Light Source, which provided a focal width of 122 nm for 12 keV x rays. Though the PMMA has a poor radiation tolerance, it has a better process tolerance, and it can lay a good foundation for the fabrication of SU8 based CKLs by LIGA technology, which has a better radiation tolerance. Compared to the Si CKLs fabricated by dry etching, the PMMA CKLs are higher in depth, smoother at the sidewall, and have better nanofocusing.