Wet-etched diffractive lenses for hard X-rays

被引：17
|
作者：
David, C [1 ]
Ziegler, E
Nöhammer, B
机构：
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France
来源：
JOURNAL OF SYNCHROTRON RADIATION | 2001年 / 8卷 / 03期
关键词：
zone plates; hard X-rays; microfocusing;
D O I：
10.1107/S0909049501002746
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A method for the fabrication of linear transmission Fresnel zone plates for X-rays in the 8-15 keV photon energy range is presented. The diffractive elements are generated by electron-beam lithography and chemical wet etching of [110]-oriented silicon membrane substrates. Diffractive structures with aspect ratios of more than 30 for 300 nm-wide structures were obtained. The diffraction efficiency of such a lens was measured for 13.3 keV radiation to be 20%.
引用
收藏
页码：1054 / 1055
页数：2
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