An Innovative Program Scheme for Reducing Z-Interference in Charge-Trap-Based 3-D NAND Flash Memory

被引:1
|
作者
Ahn, Sangmin [1 ]
Jo, Hyungjun [1 ]
Kim, Sungju [1 ]
Park, Sechun [2 ]
Lim, Kyunam [2 ]
Kim, Jongwoo [2 ]
Shin, Hyungcheol [1 ,3 ]
机构
[1] Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
[2] SK Hynix Inc, NAND Design Team, Icheon Si 17336, South Korea
[3] Integra Semicond Co Ltd, Seoul 06970, South Korea
关键词
Flash memories; Logic gates; Electron traps; Interference; Three-dimensional displays; Threshold voltage; Simulation; 3-D NAND flash; charge trap; program scheme; technology computer-aided design (TCAD) simulation; z-direction interference (Z-interference);
D O I
10.1109/TED.2023.3321559
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this brief, we propose an innovative program scheme to mitigatez-direction interference(Z-interference) in charge-trap-based 3-DNANDflash memory. Our approach adjusts the position of trapped electronsin charge trap nitride (CTN) layer during the program oper-ation by varying the pass voltage (V-pass) on both side wordlines (WLs) of the selected WL. Specifically, cells with a high threshold voltage (V-th) place electrons in the program direction, whereas cells with a low V-th place electrons inthe opposite direction. Depending on the program-verify(PV) level pattern of the aggressor (Agr)-victim cell (Vic),the effective gate pitch can be modified, even though the physical gate pitch is fixed. We validate our proposed scheme using technology computer-aided design (TCAD)simulations and experimental measurements.
引用
收藏
页码:6695 / 6698
页数:4
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