Accelerating formation of α-Al2O3 scale on a nanograined Ni-Al alloy by self-generated NiO top layer

被引:1
|
作者
Xin, Y. C. [1 ,2 ]
Xu, W. [1 ]
Wang, W. [1 ]
Zhang, B. [1 ]
机构
[1] Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
[2] Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China
关键词
Nanostructured Ni-Al alloy; Oxidation resistance; Alfa alumina; Nucleation; NiO; ALUMINA CATALYST SUPPORTS; OXIDATION BEHAVIOR; ALPHA-ALUMINA; PHASE-TRANSFORMATION; TRANSIENT OXIDATION; THERMAL-STABILITY; SURFACE-AREA; THIN-FILMS; STRESS; MICROSTRUCTURE;
D O I
10.1016/j.corsci.2023.111564
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Alfa (alpha)-Al2O3 is widely used to resist oxidation at high temperature. However, presence of some transient phases can reduce the oxidation resistance. Several strategies have been proposed to solve this issue. Here, we found that nucleation of alpha-Al2O3 can be accelerated by a NiO layer on the surface of nanostructured Ni-7 wt%Al alloy. The oxidation rate constant is an order of magnitude lower than that of beta-NiAl after 1000 degrees C oxidation. The enhanced growth compressive stress in scale is supposed to facilitate the alpha nucleation. This provides a novel strategy to develop advanced engineering alloys with high temperature applications.
引用
收藏
页数:11
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