Influence of Experimental Parameters on Reactive Magnetron Sputtering CNx Thin Films

被引：0
|
作者：
Weitao ZHENG
Tao DING (Dept. of Materials Science
J.-E Sundgren (Dept. of Physics
机构：
来源：
Journal of Materials Science & Technology | 1997年 / 02期
关键词：
Thin; Influence of Experimental Parameters on Reactive Magnetron Sputtering CN_x Thin Films; CN;
D O I：
暂无
中图分类号：
O613 [非金属元素及其化合物];
学科分类号：
070301 ; 081704 ;
摘要：
Carbon nitride thin films were deposited on Si(001) using unbalanced magnetron sputtering at different experimental parameters. The effects of nitrogen partial pressure, substrate temperature and substrate bias on the deposition rate and nitrogen content are discussed.
引用
收藏
页码：154 / 156
页数：3
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