Optimization of Wye-Delta-Type Quantum Hall Resistance Standard

被引：0
|
作者：
Yang, Yanfei [1 ]
Jarrett, Dean G. [1 ]
Panna, Alireza R. [1 ]
Yang, Cheng Hsueh [1 ,2 ]
Rigosi, Albert F. [1 ]
Ngoc Thanh Mai Tran [1 ,3 ]
Newell, David B. [1 ]
Elmquist, Randolph E. [1 ]
机构：
[1] NIST, 100 Bur Dr,Stop 8171, Gaithersburg, MD 20899 USA
[2] Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan
[3] Univ Maryland, Joint Quantum Inst, College Pk, MD 20742 USA
来源：
2024 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS, CPEM 2024 | 2024年
关键词：
dual-source bridge; wye-delta transformation; quantum Hall array resistance standard; dual-output;
D O I：
10.1109/CPEM61406.2024.10646005
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Theoretically wye-delta transformation can be used to realize ultra-high resistances up to PO. For graphene-based quantum Hall array resistance standards fabricated to utilize the wye-delta transformation, a few challenges present themselves, including the unique quantized resistance in a graphene Hall bar and the limitation of the area of homogeneous high-quality graphene. In this paper, we discuss approaches to optimize the transformation for quantum Hall array resistance standard and propose a dual-output design for 1 M Omega and 100 M Omega as an alternative to other build-up techniques, shortening the path from quantum resistance standards.
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页数：2
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