Optimization of Wye-Delta-Type Quantum Hall Resistance Standard

被引：0

作者：

Yang, Yanfei ^{[1
]}

Jarrett, Dean G. ^{[1
]}

Panna, Alireza R. ^{[1
]}

Yang, Cheng Hsueh ^{[1
,2
]}

Rigosi, Albert F. ^{[1
]}

Ngoc Thanh Mai Tran ^{[1
,3
]}

Newell, David B. ^{[1
]}

Elmquist, Randolph E. ^{[1
]}

机构：

[1] NIST, 100 Bur Dr,Stop 8171, Gaithersburg, MD 20899 USA

[2] Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan

[3] Univ Maryland, Joint Quantum Inst, College Pk, MD 20742 USA

来源：

2024 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS, CPEM 2024 | 2024年

关键词：

dual-source bridge; wye-delta transformation; quantum Hall array resistance standard; dual-output;

D O I：

10.1109/CPEM61406.2024.10646005

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Theoretically wye-delta transformation can be used to realize ultra-high resistances up to PO. For graphene-based quantum Hall array resistance standards fabricated to utilize the wye-delta transformation, a few challenges present themselves, including the unique quantized resistance in a graphene Hall bar and the limitation of the area of homogeneous high-quality graphene. In this paper, we discuss approaches to optimize the transformation for quantum Hall array resistance standard and propose a dual-output design for 1 M Omega and 100 M Omega as an alternative to other build-up techniques, shortening the path from quantum resistance standards.

引用

页数：2

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