Low-temperature growth of carbon nanotube by plasma-enhanced chemical vapor deposition using nickel catalyst

被引：0
|
作者：
Ryu, Kyoungmin [1 ]
Kang, Mihyun [1 ]
Kim, Yangdo [2 ]
Jeon, Heyongtag [1 ]
机构：
[1] Division of Mat. Sci. and Eng., Hanyan University, Seoul 133-791, Korea, Republic of
[2] Sch. of Mat. Sci. and Engineering, Pusan National University, Pusan 609-735, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 6 A期
关键词：
D O I：
10.1143/jjap.42.3578
中图分类号：
学科分类号：
摘要：
12
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页码：3578 / 3581
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