Effects of Sn+ ion implantation and post-implantation annealing on the thermoelectric properties of n-type PbTe in FGM design

被引:0
|
作者
Shen, Q. [1 ]
Zhang, L. [1 ]
Wang, G. [1 ]
Chen, L. [2 ]
Tu, R. [2 ]
Hirai, T. [2 ]
机构
[1] State Key Lab. of Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
[2] Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-77, Japan
来源
Materials Science Forum | 1999年 / 308-311卷
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:711 / 716
相关论文
共 50 条
  • [41] Ga Ohmic contact for n-type diamond by ion implantation
    Teraji, T
    Koizumi, S
    Kanda, H
    APPLIED PHYSICS LETTERS, 2000, 76 (10) : 1303 - 1305
  • [42] Band gap renormalization in n-type GeSn alloys made by ion implantation and flash lamp annealing
    Prucnal, S.
    Berencen, Y.
    Wang, M.
    Rebohle, L.
    Kudrawiec, R.
    Polak, M.
    Zviagin, V.
    Schmidt-Grund, R.
    Grundmann, M.
    Grenzer, J.
    Turek, M.
    Drozdziel, A.
    Pyszniak, K.
    Zuk, J.
    Helm, M.
    Skorupa, W.
    Zhou, S.
    JOURNAL OF APPLIED PHYSICS, 2019, 125 (20)
  • [43] N-type doping of BaSi2 epitaxial films by phosphorus ion implantation and thermal annealing
    Hara, Kosuke O.
    Hoshi, Yusuke
    Usami, Noritaka
    Shiraki, Yasuhiro
    Nakamura, Kotaro
    Toko, Kaoru
    Suemasu, Takashi
    THIN SOLID FILMS, 2014, 557 : 90 - 93
  • [44] Low temperature deactivation of Ge heavily n-type doped by ion implantation and laser thermal annealing
    Milazzo, R.
    Impellizzeri, G.
    Piccinotti, D.
    De Salvador, D.
    Portavoce, A.
    La Magna, A.
    Fortunato, G.
    Mangelinck, D.
    Privitera, V.
    Carnera, A.
    Napolitani, E.
    APPLIED PHYSICS LETTERS, 2017, 110 (01)
  • [45] Phosphorus ion implantation and annealing induced n-type conductivity and microstructure evolution in ultrananocrystalline diamond films
    Hu, X. J.
    Ye, J. S.
    Hu, H.
    Chen, X. H.
    Shen, Y. G.
    APPLIED PHYSICS LETTERS, 2011, 99 (13)
  • [46] Thermoelectric properties of n-type SiGe alloys with Sn incorporation
    Ke Meng
    La-Mei Zhao
    Ning-Yuan Zhang
    Zhuang-Fei Zhang
    Wei-Xia Shen
    Yue-Wen Zhang
    Biao Wan
    Chao Fang
    Liang-Chao Chen
    Qian-Qian Wang
    Ju-Long He
    Xiao-Peng Jia
    RareMetals, 2022, 41 (12) : 4156 - 4163
  • [47] Thermoelectric properties of n-type SiGe alloys with Sn incorporation
    Ke Meng
    La-Mei Zhao
    Ning-Yuan Zhang
    Zhuang-Fei Zhang
    Wei-Xia Shen
    Yue-Wen Zhang
    Biao Wan
    Chao Fang
    Liang-Chao Chen
    Qian-Qian Wang
    Ju-Long He
    Xiao-Peng Jia
    Rare Metals, 2022, 41 : 4156 - 4163
  • [48] Thermoelectric properties of n-type SiGe alloys with Sn incorporation
    Meng, Ke
    Zhao, La-Mei
    Zhang, Ning-Yuan
    Zhang, Zhuang-Fei
    Shen, Wei-Xia
    Zhang, Yue-Wen
    Wan, Biao
    Fang, Chao
    Chen, Liang-Chao
    Wang, Qian-Qian
    He, Ju-Long
    Jia, Xiao-Peng
    RARE METALS, 2022, 41 (12) : 4156 - 4163
  • [49] SiC donor doping by 300°C P implantation:: Characterization of the doped layer properties in dependence of the post-implantation annealing temperature
    Poggi, A
    Nipoti, R
    Moscatelli, F
    Cardinali, GC
    Canino, M
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 945 - 948
  • [50] Joint of n-type PbTe with different carrier concentration and its thermoelectric properties
    Imai, Y
    Shinohara, Y
    Nishida, IA
    Okamoto, M
    Isoda, Y
    Ohkoshi, T
    Fujii, T
    Shiota, I
    Kaibe, HT
    FUNCTIONALLY GRADED MATERIALS 1996, 1997, : 617 - 622