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Inductively coupled plasma etching of SiO2 layers for planar lightwave circuits

被引：3
|
作者：
Jung, Sun-Tae [1 ]
Song, Hyung-Seung [1 ]
Kim, Dong-Su [1 ]
Kim, Hyoun-Soo [1 ]
机构：
[1] Applied Optics Research Group, Samsung Electronics Co., Suwon, P.O., Kyunggi-Do, Korea, Republic of
来源：
Thin Solid Films | 1999年 / 341卷 / 01期
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页码：188 / 191
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