Inductively coupled plasma etching of SiO2 layers for planar lightwave circuits

被引：3

作者：

Jung, Sun-Tae ^{[1
]}

Song, Hyung-Seung ^{[1
]}

Kim, Dong-Su ^{[1
]}

Kim, Hyoun-Soo ^{[1
]}

机构：

[1] Applied Optics Research Group, Samsung Electronics Co., Suwon, P.O., Kyunggi-Do, Korea, Republic of

来源：

Thin Solid Films | 1999年 / 341卷 / 01期

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页码：188 / 191

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