Characterization of silicon oxynitride thin films by infrared reflection absorption spectroscopy

被引：0
|
作者：
Firon, M. [1 ]
Bonnelle, C. [1 ]
Mayeux, A. [1 ]
机构：
[1] Universite Pierre et Marie Curie, Paris, France
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 1996年 / 14卷 / 04期
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页码：2488 / 2492
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