Characterization of graded refractive index silicon oxynitride thin films by spectroscopic ellipsometry

被引：0
|
作者：
Callard, S. [1 ]
Gagnaire, A. [1 ]
Joseph, J. [1 ]
机构：
[1] Ecole Centrale de Lyon, Ecully, France
来源：
Thin Solid Films | 1998年 / 313-314卷 / 1-2期
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摘要：
12
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页码：384 / 388
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