Influence of crystal quality on the electronic properties of n-type 3C-SiC grown by low temperature low pressure chemical vapor deposition

被引:0
|
作者
机构
[1] Eickhoff, M.
[2] Möller, H.
[3] Stoemenos, J.
[4] Zappe, S.
[5] Kroetz, G.
[6] Stutzmann, M.
来源
Eickhoff, M. (Martin.Eickhoff@wsi.tu-muenchen.de) | 1600年 / American Institute of Physics Inc.卷 / 95期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
44
引用
收藏
相关论文
共 50 条
  • [31] GREATLY IMPROVED 3C-SIC P-N-JUNCTION DIODES GROWN BY CHEMICAL VAPOR-DEPOSITION
    NEUDECK, PG
    LARKIN, DJ
    STARR, JE
    POWELL, JA
    SALUPO, CS
    MATUS, LG
    IEEE ELECTRON DEVICE LETTERS, 1993, 14 (03) : 136 - 139
  • [32] Investigation of low doped n-type and p-type 3C-SiC layers grown on 6H-SiC substrates by sublimation epitaxy
    Zoulis, G.
    Sun, J.
    Beshkova, M.
    Vasiliauskas, R.
    Juillaguet, S.
    Peyre, H.
    Syvajarvi, M.
    Yakimova, R.
    Camassel, J.
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 179 - +
  • [33] Growth of 3C-SiC on Si(100) by Low Pressure Chemical Vapor Deposition Using a Modified Four-Step Process
    Chen, W. -Y.
    Chen, C. C.
    Hwang, J.
    Huang, C. -F.
    CRYSTAL GROWTH & DESIGN, 2009, 9 (06) : 2616 - 2619
  • [34] Measurement of residual stress and elastic modulus of polycrystalline 3C-SiC films deposited by low-pressure chemical vapor deposition
    Fu, XA
    Dunning, JL
    Zorman, CA
    Mehregany, M
    THIN SOLID FILMS, 2005, 492 (1-2) : 195 - 202
  • [36] LOW-TEMPERATURE GROWTH OF 3C-SIC ON SI SUBSTRATE BY CHEMICAL VAPOR-DEPOSITION USING HEXAMETHYLDISILANE AS A SOURCE MATERIAL
    TAKAHASHI, K
    NISHINO, S
    SARAIE, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (12) : 3565 - 3571
  • [37] Influence of HCl and H-2 on the heteroepitaxial growth of 3C-SiC films on Si(100) via low-temperature chemical vapor deposition
    Edgar, JH
    Gao, Y
    THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 : 699 - 704
  • [39] PHOTOLUMINESCENCE SPECTROSCOPY OF ION-IMPLANTED 3C-SIC GROWN BY CHEMICAL VAPOR-DEPOSITION
    FREITAS, JA
    BISHOP, SG
    EDMOND, JA
    RYU, J
    DAVIS, RF
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 2011 - 2016
  • [40] Direct insight into grains formation in Si layers grown on 3C-SiC by chemical vapor deposition
    Khazaka, Rami
    Portail, Marc
    Vennegues, Philippe
    Alquier, Daniel
    Michaud, Jean Francois
    ACTA MATERIALIA, 2015, 98 : 336 - 342