Voltage gain in GaAs-based lateral single-electron transistors having Schottky wrap gates

被引:0
|
作者
Satoh, Yoshihiro [1 ]
Okada, Hiroshi [1 ]
Jinushi, Kei-ichiroh [1 ]
Fujikura, Hajime [1 ]
Hasegawa, Hideki [1 ]
机构
[1] Hokkaido Univ, Sapporo, Japan
关键词
Computer simulation - Electric potential - Electron tunneling - Electrostatics - Gates (transistor) - Nanotechnology - Semiconducting gallium arsenide - Semiconductor quantum wires;
D O I
暂无
中图分类号
TN3 [半导体技术]; TN4 [微电子学、集成电路(IC)];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ; 1401 ;
摘要
Gain characteristics of GaAs-based lateral single-electron transistors (SETs) formed by putting two- or three-wrap gates (WPGs) on etched GaAs quantum wire were investigated in detail theoretically and experimentally. The computer simulation of potential distribution showed that the three-WPG SET allows independent control of the dot geometry and the tunneling barrier profile and that the three-gate device realizes much tighter control of the dot potential and a higher voltage gain than the two-gate device. Both two- and three-gate SETs were fabricated experimentally. These devices showed clear Coulomb blockade oscillations which were visible up to 40 K. In excellent agreement with the computer simulation, a high voltage gain of 1.3 was achieved in the three-gate SET, whereas the gain of the two-gate SET remained below unity. This is the first report on achieving a voltage gain higher than unity in III-V SETs. This field effect transistor (FET)-like lateral SET structure seems to be promising for the realization of III-V SET ultra large scale integrated circuits (ULSIs).
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页码:410 / 414
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