Large-area milky transparent conducting Al-doped ZnO films prepared by magnetron sputtering

被引:0
|
作者
机构
[1] Minami, Tadatsugu
[2] Sato, Hirotoshi
[3] Takata, Shinzo
[4] Ogawa, Norihiro
[5] Mouri, Takashi
来源
Minami, Tadatsugu | 1600年 / 31期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
下载
收藏
相关论文
共 50 条
  • [41] New transparent conducting Al-doped ZnO film preparation techniques for improving resistivity distribution in magnetron sputtering deposition
    Minami, Tadatsugu
    Miyata, Toshihiro
    Ohtani, Yuusuke
    Mochizuki, Yuu
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (12-16): : L409 - L412
  • [42] New transparent conducting Al-doped ZnO film preparation techniques for improving resistivity distribution in magnetron sputtering deposition
    Minami, Tadatsugu
    Miyata, Toshihiro
    Ohtani, Yuusuke
    Mochizuki, Yuu
    Japanese Journal of Applied Physics, Part 2: Letters, 2006, 45 (12-16):
  • [43] Properties of transparent conductive ZnO:Al thin films prepared by magnetron sputtering
    Fu, EG
    Zhuang, DM
    Zhang, G
    Ming, Z
    Yang, WF
    Liu, JJ
    MICROELECTRONICS JOURNAL, 2004, 35 (04) : 383 - 387
  • [44] Growth of al-doped ZnO films by mid frequency DC magnetron sputtering
    Lin, Qinggeng
    Gao, Xiaoyong
    Liu, Yufen
    Lu, Jingxiao
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2008, 28 (06): : 566 - 569
  • [45] Properties of Al-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering
    李兴鳌
    Journal of Wuhan University of Technology(Materials Science), 2007, (03) : 446 - 449
  • [46] Growth of Al-doped ZnO thin films by pulsed DC magnetron sputtering
    Ko, H
    Tai, WP
    Kim, KC
    Kim, SH
    Suh, SJ
    Kim, YS
    JOURNAL OF CRYSTAL GROWTH, 2005, 277 (1-4) : 352 - 358
  • [47] Properties of Al-doped copper nitride films prepared by reactive magnetron sputtering
    Xing’ao Li
    Zuli Liu
    Anyou Zuo
    Zuobin Yuan
    Jianping Yang
    Kailun Yao
    Journal of Wuhan University of Technology-Mater. Sci. Ed., 2007, 22 : 446 - 449
  • [48] Properties of Al-doped copper nitride films prepared by reactive magnetron sputtering
    Li Xing'ao
    Liu Zuli
    Zuo Anyou
    Yuan Zuobin
    Yang Jianping
    Yao Kailun
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2007, 22 (03): : 446 - 449
  • [49] Mn-doped ZnO transparent conducting films deposited by DC magnetron sputtering
    Zhang, Hua-fu
    Liu, Rui-jin
    Liu, Han-fa
    Lei, Cheng-xin
    Feng, Dong-tai
    Yuan, Chang-Kun
    MATERIALS LETTERS, 2010, 64 (05) : 605 - 607
  • [50] Structure and Properties of Al-Doped ZnO Transparent Conductive Thin-Films Prepared by Asymmetric Bipolar Pulsed DC Reactive Magnetron Sputtering
    Hsu, Fu-Yung
    Chen, Tse-Hao
    Peng, Kun-Cheng
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2009, 9 (07) : 4008 - 4015