Large-area milky transparent conducting Al-doped ZnO films prepared by magnetron sputtering

被引：0
|
作者：
机构：
[1] Minami, Tadatsugu
[2] Sato, Hirotoshi
[3] Takata, Shinzo
[4] Ogawa, Norihiro
[5] Mouri, Takashi
来源：
Minami, Tadatsugu | 1600年 / 31期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
下载
收藏
相关论文
共 50 条
  • [21] Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering
    Szyszka, B
    Sittinger, V
    Jiang, X
    Hong, RJ
    Werner, W
    Pflug, A
    Ruske, M
    Lopp, A
    THIN SOLID FILMS, 2003, 442 (1-2) : 179 - 183
  • [22] Study on Al-doped ZnO Films Prepared by Magnetron Sputtering with Rapid Thermal Annealing Process
    Wang, Hua
    Xu, Jiwen
    Ren, Mingfang
    Yang, Ling
    MANUFACTURING SCIENCE AND ENGINEERING, PTS 1-5, 2010, 97-101 : 582 - 585
  • [23] Fluorine-doped ZnO transparent conducting thin films prepared by radio frequency magnetron sputtering
    Tsai, Yu-Zen
    Wang, Na-Fu
    Tsai, Chun-Lung
    THIN SOLID FILMS, 2010, 518 (17) : 4955 - 4959
  • [24] Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition
    Agura, H
    Suzuki, A
    Matsushita, T
    Aoki, T
    Okuda, M
    THIN SOLID FILMS, 2003, 445 (02) : 263 - 267
  • [25] Formation of Al-doped ZnO films by de magnetron reactive sputtering
    Chen, M
    Pei, ZL
    Sun, C
    Wen, LS
    Wang, X
    MATERIALS LETTERS, 2001, 48 (3-4) : 194 - 198
  • [26] The effect of annealing on Al-doped ZnO films deposited by RF magnetron sputtering method for transparent electrodes
    Cho, Hyung Jun
    Lee, Sung Uk
    Hong, Byungyou
    Shin, Yong Deok
    Ju, Jin Young
    Kim, Hee Dong
    Park, Mungi
    Choi, Won Seok
    THIN SOLID FILMS, 2010, 518 (11) : 2941 - 2944
  • [27] Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering
    Hong, RJ
    Jiang, X
    Sittinger, V
    Szyszka, B
    Höing, T
    Bräuer, G
    Heide, G
    Frischat, GH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (03): : 900 - 905
  • [28] Effect of oxygen flow rate on physical properties of Al-doped ZnO transparent conducting films prepared by reactive dc magnetron sputtering using metallic Zn:Al target
    Gaewdang, T.
    Wongchaoen, Ng
    INTERNATIONAL CONFERENCE ON SUSTAINABLE ENERGY AND GREEN TECHNOLOGY 2019, 2020, 463
  • [29] Textured surface structures formed using new techniques on transparent conducting Al-doped zinc oxide films prepared by magnetron sputtering
    Minami, Tadatsugu
    Miyata, Toshihiro
    Uozaki, Ryousuke
    Sai, Hitoshi
    Koida, Takashi
    THIN SOLID FILMS, 2016, 614 : 56 - 61
  • [30] Effects of secondary magnetic field on the properties of Al-doped ZnO films prepared by RF magnetron sputtering
    Chen, Ming
    Zhou, Xiying
    Shao, Jiajia
    Mao, Xiujuan
    Yang, Guoliang
    CERAMICS INTERNATIONAL, 2014, 40 (09) : 14347 - 14353
12345