Vibrational properties of a-Si:H films containing voids: experiment and modeling

被引：0
|
作者：
Barriquand, N. [1 ]
Paillard, V. [1 ]
Rocai Cabarrocas, P. [1 ]
Landa, G. [1 ]
Djafari-Rouhani, M. [1 ]
机构：
[1] Laboratoire de Physique des Solides, Universiteá Paul Sabatier, 118 route de Narbonne, 31062 Toulouse cedex-4, France
来源：
Materials Research Society Symposium - Proceedings | 1999年 / 557卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：451 / 455
相关论文
共 50 条
  • [31] Electronic properties of floating bonds in a-Si and a-Si:H
    Fornari, M
    Peressi, M
    de Gironcoli, S
    Baldereschi, A
    PROCEEDINGS OF THE VII ITALIAN-SWISS WORKSHOP ADVANCES IN COMPUTATIONAL MATERIALS SCIENCE II, 1998, 61 : 79 - 86
  • [32] Wide-gap a-Si:H fabricated by controlling voids
    Yoshino, K
    Futako, W
    Wasai, Y
    Shimizu, I
    AMORPHOUS SILICON TECHNOLOGY - 1996, 1996, 420 : 335 - 340
  • [33] PREPARATION AND PROPERTIES OF a-Si:H/a-SiNx:H SUPERLATTICE FILMS.
    Wang, Zhichao
    Liu, Xiangna
    He, Yuliang
    Wu, Rulin
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1987, 8 (01): : 94 - 98
  • [34] Photoconductivity of thin a-Si:H films
    A. G. Kazanskiĭ
    O. G. Koshelev
    A. Yu. Sazonov
    A. A. Khomich
    Semiconductors, 2008, 42 (2) : 192 - 194
  • [35] Photoconductivity of thin a-Si:H films
    Kazanskii, A. G.
    Koshelev, O. G.
    Sazonov, A. Yu.
    Khomich, A. A.
    SEMICONDUCTORS, 2008, 42 (02) : 192 - 194
  • [36] First-principles simulations of vibrational decay and lifetimes in a-Si:H and a-Si:D
    Atta-Fynn, Raymond
    Drabold, David A.
    Elliott, Stephen R.
    Biswas, Parthapratim
    PHYSICAL REVIEW B, 2017, 95 (10)
  • [37] Effects of process variables on properties and composition of a-Si:C:H films
    Moskowitz, IL
    Lanford, WA
    Babu, SV
    JOURNAL OF MATERIALS RESEARCH, 2003, 18 (01) : 129 - 138
  • [38] Emitting properties of a-Si:C:H films with a gold submicron grating
    Pavlov, S. I.
    Dyakov, S. A.
    Samusev, A. K.
    Nashchekin, A. V.
    Tanklevskaya, E. M.
    Feoktistov, N. A.
    Gippius, N. A.
    Tikhodeev, S. G.
    Pidgayko, D.
    Pevtsov, A. B.
    METANANO 2019, 2020, 1461
  • [39] Preparation and Properties of a-Si:H Thin Films Deposited on Different Substrates
    饶瑞
    Journal of Wuhan University of Technology(Materials Science Edition), 2007, (01) : 126 - 128
  • [40] PROPERTIES OF A-SI,H FILMS PREPARED BY ECR PLASMA CVD METHOD
    NARIKAWA, S
    HAYAKAWA, T
    ADACHI, K
    HONDA, I
    YAMAMOTO, Y
    SHARP TECHNICAL JOURNAL, 1992, (54): : 31 - 34
12345