PREPARATION AND PROPERTIES OF a-Si:H/a-SiNx:H SUPERLATTICE FILMS.

被引:0
|
作者
Wang, Zhichao [1 ]
Liu, Xiangna [1 ]
He, Yuliang [1 ]
Wu, Rulin [1 ]
机构
[1] Nanjing Univ, China, Nanjing Univ, China
关键词
CRYSTALS - SEMICONDUCTING SILICON COMPOUNDS;
D O I
暂无
中图分类号
学科分类号
摘要
The preparation method, structure and optical quantum size effect of a-Si:H/a-SiN//x: H superlattice films are reported.
引用
收藏
页码:94 / 98
相关论文
共 50 条
  • [2] RAMAN STUDIES OF A-SI-H/A-SINX AND A-SI/A-SINX SUPERLATTICES
    HONMA, I
    TANAKA, T
    KOMIYAMA, H
    TANAKA, K
    AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 : 669 - 674
  • [3] 非晶态异质结构a-Si:H/a-SiNx:H和a-Si:H,a-SiNx:H薄膜的应力研究
    王万录
    廖克俊
    物理学报, 1987, (12) : 1529 - 1537
  • [4] Persistent photoconductance in a-Si:H/a-SiNx:H multilayers
    Hamed, A.
    Fritzsche, H.
    Philosophical Magazine B: Physics of Condensed Matter; Electronic, Optical and Magnetic Properties, 1991, 63 (01): : 33 - 46
  • [5] Comprehensive investigation of silicon surface passivation by a-Si:H and a-SiNx:H films
    Laades, Abdelazize
    Blech, Michael
    Baehr, Mario
    Lauer, Kevin
    Lawerenz, Alexander
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3, 2011, 8 (03):
  • [6] Laser crystallization of a-Si:H/a-SiNx:H multilayers
    Huang, XG
    Lee, WK
    Liu, D
    Yu, ZX
    LASERS AS TOOLS FOR MANUFACTURING OF DURABLE GOODS AND MICROELECTRONICS, 1996, 2703 : 375 - 379
  • [7] Thermal annealing of a-Si:H/a-SiNx:H multilayers
    Wang, L
    Huang, X
    Ma, Z
    Li, Z
    Shi, J
    Zhang, L
    Bao, Y
    Wang, X
    Li, W
    Xu, J
    Chen, K
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2002, 74 (06): : 783 - 786
  • [8] QUASIPERIODIC a-Si:H/a-SiNx:H SUPERLATTICES.
    Mao Guomin
    Chen Kunji
    Feng Duan
    Li Zhifeng
    Yan Yong
    Chen Hong
    Du Jiafang
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1988, 9 (01): : 100 - 102
  • [9] Thermal annealing of a-Si:H/a-SiNx:H multilayers
    L. Wang
    X. Huang
    Z. Ma
    Z. Li
    J. Shi
    L. Zhang
    Y. Bao
    X. Wang
    W. Li
    J. Xu
    K. Chen
    Applied Physics A, 2002, 74 : 783 - 786
  • [10] 沉积条件对GD′a-SiNx:H,a-Si:H及a-Si:H/a-SiNx:H多层膜某些性质的影响
    廖克俊
    王万录
    马世隆
    李顺文
    真空科学与技术学报, 1989, (01) : 47 - 50