Deep X-ray lithography with a tunable wavelength shifter at CAMD

被引：0
|
作者：
Malek, C. Khan [1 ]
Saile, V. [1 ]
Manohara, H. [1 ]
Craft, B. [1 ]
机构：
[1] Ctr. Adv. Microstructures Devices, Louisiana State University, 3990 West Lakeshore Drive, Baton Rouge, LA 70803, United States
来源：
Journal of Synchrotron Radiation | 1998年 / 5卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1095 / 1098
相关论文
共 50 条
  • [21] Sub-wavelength gratings based on X-ray lithography
    Li, Yi-Gui
    Sugiyama, Susumu
    Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering, 2007, 5 (04): : 249 - 252
  • [22] Kinoform X-ray lens creation in polymer materials by deep X-ray lithography
    Nazmov, V
    Shabel'nikov, L
    Pantenburg, FJ
    Mohr, J
    Reznikov, E
    Snigirev, A
    Snigireva, I
    Kouznetsov, S
    DiMichiel, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 217 (03): : 409 - 416
  • [23] Graphite-based x-ray masks for deep and ultradeep x-ray lithography
    Coane, P
    Giasolli, R
    De Caro, F
    Mancini, DC
    Desta, Y
    Göttert, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3618 - 3624
  • [24] Heat load problems in deep X-ray lithography
    Cudin, I
    De Bona, F
    Gambitta, A
    Pérennés, F
    Turchet, A
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2001, 467 (PART II): : 1265 - 1268
  • [25] Simulation of energy deposition in deep X-ray lithography
    Zumaqué, H
    Kohring, GA
    Hormes, J
    PARALLEL COMPUTING: FUNDAMENTALS, APPLICATIONS AND NEW DIRECTIONS, 1998, 12 : 221 - 224
  • [26] Aligned double exposure in deep X-ray lithography
    Schmidt, A
    Ehrfeld, W
    Lehr, H
    Muller, L
    Reuther, F
    Schmidt, M
    Zetterer, T
    MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 235 - 238
  • [27] Fabrication of photonic crystals by deep x-ray lithography
    Feiertag, G
    Ehrfeld, W
    Freimuth, H
    Kolle, H
    Lehr, H
    Schmidt, M
    Sigalas, MM
    Soukoulis, CM
    Kiriakidis, G
    Pedersen, T
    Kuhl, J
    Koenig, W
    APPLIED PHYSICS LETTERS, 1997, 71 (11) : 1441 - 1443
  • [28] Dosage modeling for deep x-ray lithography application
    Shih, WP
    Hwang, GJ
    Shew, BY
    Cheng, Y
    MICROSYSTEM TECHNOLOGIES, 1998, 4 (02) : 82 - 85
  • [29] Thermal management of masks for deep x-ray lithography
    Khounsary, A
    Chojnowski, D
    Mancini, DC
    Lai, B
    Dejus, R
    HIGH HEAT FLUX AND SYNCHROTRON RADIATION BEAMLINES, 1997, 3151 : 92 - 101
  • [30] Cost effective masks for deep X-ray lithography
    Scheunemann, HU
    Loechel, B
    Jian, L
    Schondelmaier, D
    Desta, YM
    Goettert, J
    SMART SENSORS, ACTUATORS, AND MEMS, PTS 1 AND 2, 2003, 5116 : 775 - 781
12345