Heat load problems in deep X-ray lithography

被引：4
|
作者：
Cudin, I
De Bona, F
Gambitta, A
Pérennés, F
Turchet, A
机构：
[1] Sincrotrone Trieste, Soc Consoirtile P Azioni, Micro Fabricat Grp, I-34012 Trieste, Italy
[2] Univ Udine, I-33100 Udine, Italy
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2001年 / 467卷 / PART II期
关键词：
deep X-ray lithography; X-ray mask; thermoelasticity; FEM; transient analysis;
D O I：
10.1016/S0168-9002(01)00655-6
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A 3D mathematical model of a complete Deep X-Ray Lithography scanning unit based on the Finite Element Method (FEM) was developed to analyse the replication errors induced by the thermoelastic deformations occurring under irradiation. Different thermal and mechanical constraint conditions were considered in order to evaluate the maximum displacements of the irradiated mask area. The obtained results show that, to evaluate the replication errors, the support ring and its mechanical fittings have to be carefully considered in the model. It is observed that the absolute position error and the blur error and the error induced by the thermal expansion of the mask are both position dependent. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：1265 / 1268
页数：4
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