Excimer laser reactive ablation deposition of silicon nitride films

被引：0
|
作者：
机构：
[1] D'Anna, E.
[2] Leggieri, G.
[3] Luches, A.
[4] Martino, M.
[5] Perrone, A.
[6] Majni, G.
[7] Mengucci, P.
[8] Alexandrescu, R.
[9] Mihailescu, I.N.
[10] Zemek, J.
来源：
D'Anna, E. | 1600年 / Elsevier Science B.V., Amsterdam, Netherlands卷 / 86期
关键词：
Laser reactive ablation - Profilometry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] EXCIMER-LASER REACTIVE ABLATION DEPOSITION OF SILICON-NITRIDE FILMS
    DANNA, E
    LEGGIERI, G
    LUCHES, A
    MARTINO, M
    PERRONE, A
    MAJNI, G
    MENGUCCI, P
    ALEXANDRESCU, R
    MIHAILESCU, IN
    ZEMEK, J
    APPLIED SURFACE SCIENCE, 1995, 86 (1-4) : 170 - 174
  • [2] LASER-REACTIVE ABLATION DEPOSITION OF SILICON-NITRIDE FILMS
    DEGIORGI, ML
    LEGGIERI, G
    LUCHES, A
    MARTINO, M
    PERRONE, A
    MAJNI, G
    MENGUCCI, P
    ZEMEK, J
    MIHAILESCU, IN
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1995, 60 (03): : 275 - 283
  • [3] LASER REACTIVE ABLATION DEPOSITION OF NITRIDE FILMS
    LUCHES, A
    LEGGIERI, G
    MARTINO, M
    PERRONE, A
    MAJNI, G
    MENGUCCI, P
    MIHAILESCU, IN
    APPLIED SURFACE SCIENCE, 1994, 79-80 : 244 - 249
  • [4] Excimer laser reactive deposition of vanadium nitride thin films
    D'Anna, E
    Di Cristoforo, A
    Fernández, M
    Leggieri, G
    Luches, A
    Majni, G
    Mengucci, P
    Nanai, L
    APPLIED SURFACE SCIENCE, 2002, 186 (1-4) : 496 - 501
  • [5] Laser reactive ablation deposition of silicon carbide films
    Leggieri, G
    Luches, A
    Martino, M
    Perrone, A
    Alexandrescu, R
    Barborica, A
    Gyorgy, E
    Mihailescu, IN
    Majni, G
    Mengucci, P
    APPLIED SURFACE SCIENCE, 1996, 96-8 : 866 - 869
  • [6] Laser reactive ablation deposition of carbon nitride thin films
    Luches, A
    Caricato, AP
    Leggieri, G
    Martino, M
    Perrone, A
    Barucca, G
    Mengucci, P
    Zemek, J
    HIGH-POWER LASERS: APPLICATIONS AND EMERGING APPLICATIONS, 1996, 2789 : 293 - 304
  • [7] Synthesis and deposition of silicon nitride films by laser reactive ablation of silicon in low pressure ammonia: A parametric study
    Mihailescu, IN
    Lita, A
    Teodorescu, VS
    Gyorgy, E
    Alexandrescu, R
    Luches, A
    Martino, M
    Barborica, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (04): : 1986 - 1994
  • [8] Deposition of high quality TiN films by excimer laser ablation in reactive gas
    1600, American Inst of Physics, Woodbury, NY, USA (74):
  • [9] Characterization of carbon nitride films prepared by laser reactive ablation deposition
    Zemek, J
    Luches, A
    Leggieri, G
    Fejfar, A
    Trchova, M
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1995, 76 : 747 - 752
  • [10] Deposition of high quality TiN films by excimer laser ablation in reactive gas
    1600, (74):
12345