Experimental results of the stochastic coulomb interaction in ion projection lithography

被引:0
|
作者
机构
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] New results on Coulomb interaction effects in relativistic heavy ion collisions
    Ristea, O.
    Ristea, C.
    Jipa, A.
    Lazanu, I
    Esanu, T.
    Calin, M.
    NUOVO CIMENTO C-COLLOQUIA AND COMMUNICATIONS IN PHYSICS, 2019, 42 (2-3):
  • [32] Wafer stage assembly for ion projection lithography
    Damm, C
    Peschel, T
    Risse, S
    Kirschstein, UC
    MICROELECTRONIC ENGINEERING, 2001, 57-8 : 181 - 185
  • [33] NOVEL ELECTROSTATIC COLUMN FOR ION PROJECTION LITHOGRAPHY
    CHALUPKA, A
    STENGL, G
    BUSCHBECK, H
    LAMMER, G
    VONACH, H
    FISCHER, R
    HAMMEL, E
    LOSCHNER, H
    NOWAK, R
    WOLF, P
    FINKELSTEIN, W
    HILL, RW
    BERRY, IL
    HARRIOTT, LR
    MELNGAILIS, J
    RANDALL, JN
    WOLFE, JC
    STROH, H
    WOLLNIK, H
    MONDELLI, AA
    PETILLO, JJ
    LEUNG, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3513 - 3517
  • [34] Ion projection lithography:: International development program
    Kaesmaier, R
    Löschner, H
    Stengl, G
    Wolfe, JC
    Ruchhoeft, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3091 - 3097
  • [35] ION PROJECTION LITHOGRAPHY FOR SUBMICRON MODIFICATION OF MATERIALS
    STENGL, G
    LOSCHNER, H
    WOLF, P
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 : 987 - 994
  • [36] Modeling of edge roughness in ion projection lithography
    Henke, W
    Torkler, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3112 - 3118
  • [37] Multicusp sources for ion beam projection lithography
    Lee, Y
    Gough, RA
    Kunkel, WB
    Leung, KN
    Vujic, J
    Williams, MD
    Wutte, D
    Zahir, N
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (02): : 877 - 879
  • [38] ION PROJECTION LITHOGRAPHY PROCESS ON DRY RESIST
    KHOLOPKIN, AI
    LYAKHOV, MN
    PANKRATENKO, DA
    SIMONOV, VV
    VYATKIN, AF
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 55 (1-4): : 902 - 904
  • [39] Ion projection lithography: next generation technology?
    Gross, G.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1997, 15 (06):
  • [40] ION PROJECTION LITHOGRAPHY OVER WAFER TOPOGRAPHY
    BRUNGER, WH
    BUCHMANN, LM
    TORKLER, MA
    FINKELSTEIN, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3547 - 3549