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- [21] CURRENT STATUS OF ION PROJECTION LITHOGRAPHY PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 537 : 138 - 145
- [22] PROJECTION ION-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2409 - 2415
- [23] Ion projection lithography for nano patterning MATERIALS ISSUES AND MODELING FOR DEVICE NANOFABRICATION, 2000, 584 : 3 - 10
- [24] ION PROJECTION LITHOGRAPHY FOR VACUUM MICROELECTRONICS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (02): : 487 - 492
- [25] PROJECTION ION LITHOGRAPHY WITH APERTURE LENSES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 1028 - 1031
- [26] Ion projection lithography for IC manufacturing 15TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS '98, 1999, 3665 : 69 - 75
- [27] Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3207 - 3209
- [28] Direct measurement of Coulomb effects in electron beam projection lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06): : 2468 - 2473
- [29] Direct measurements and analyses of the Coulomb effects in electron projection lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06): : 3182 - 3187
- [30] Mask electron modeling for Coulomb interaction by mask-scattered electrons in electron-beam projection lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3227 - 3231