ION PROJECTION LITHOGRAPHY FOR SUBMICRON MODIFICATION OF MATERIALS

被引：11
|
作者：
STENGL, G
LOSCHNER, H
WOLF, P
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 19-20卷
关键词：
D O I：
10.1016/S0168-583X(87)80197-0
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：987 / 994
页数：8
相关论文
共 50 条
  • [1] ION PROJECTION LITHOGRAPHY FOR SUB-MICRON MODIFICATION OF MATERIALS.
    Stengl, Gerhard
    Loeschner, Hans
    Wolf, Peter
    [J]. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1986, B19-20 (pt 2 Feb III) : 987 - 994
  • [2] SUBMICRON LITHOGRAPHY AND DUV-MASTER MASKS MADE BY ION PROJECTION LITHOGRAPHY.
    Stangl, G.
    Ruedenauer, F.
    Maurer, W.
    Fallmann, W.
    [J]. Microelectronic Engineering, 1985, 3 (1-4) : 167 - 171
  • [3] Ion projection lithography
    Melngailis, J
    Loschner, H
    Stengl, G
    Berry, IL
    Mondelli, AA
    Gross, G
    [J]. PHOTOMASK AND X-RAY MASK TECHNOLOGY V, 1998, 3412 : 369 - 384
  • [4] ION PROJECTION LITHOGRAPHY
    STENGL, G
    LOSCHNER, H
    MURAY, JJ
    [J]. SOLID STATE TECHNOLOGY, 1986, 29 (02) : 119 - 126
  • [5] ION PROJECTION LITHOGRAPHY MACHINE IPLM-01 - A NEW TOOL FOR SUB-0.5-MICRON MODIFICATION OF MATERIALS
    STENGL, G
    LOSCHNER, H
    MAURER, W
    WOLF, P
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 194 - 200
  • [6] A review of ion projection lithography
    Melngailis, J
    Mondelli, AA
    Berry, IL
    Mohondro, R
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (03): : 927 - 957
  • [7] PROGRESS IN ION PROJECTION LITHOGRAPHY
    CHALUPKA, A
    FEGERL, J
    FISCHER, R
    LAMMER, G
    LOSCHNER, H
    MALEK, L
    NOWAK, R
    STENGL, G
    TRAHER, C
    WOLF, P
    [J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 229 - 240
  • [8] Review of ion projection lithography
    [J]. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1998, 16 (03):
  • [9] Development of ion sources for ion projection lithography
    Lee, Y
    Gough, RA
    Kunkel, WB
    Leung, KN
    Perkins, LT
    Pickard, DS
    Sun, L
    Vujic, J
    Williams, MD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 3947 - 3950
  • [10] CURRENT STATUS OF ION PROJECTION LITHOGRAPHY
    STENGL, G
    LOSCHNER, H
    MAURER, W
    WOLF, P
    [J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 537 : 138 - 145
12345