Behavior of gallium secondary ion intensity in gallium focused ion beam secondary ion mass spectrometry

被引：0
|
作者：
Sakamoto, Tetsuo [1 ]
Owari, Masanori [1 ]
Nihei, Yoshimasa [1 ]
机构：
[1] Univ of Tokyo, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 3 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1287 / 1291
相关论文
共 50 条
  • [31] STUDY OF THE DIFFUSION OF GALLIUM IN SILICON BY SECONDARY ION MASS-SPECTROMETRY AND NEUTRON-ACTIVATION
    GAUNEAU, M
    RUPERT, A
    HARIDOSS, S
    BENIERE, F
    ANALUSIS, 1980, 8 (04) : 142 - 147
  • [32] Cluster primary ion beam secondary ion mass spectrometry for semiconductor characterization
    Gillen, G
    Roberson, S
    Fahey, A
    Walker, M
    Bennett, J
    Lareau, RT
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000, INTERNATIONAL CONFERENCE, 2001, 550 : 687 - 691
  • [33] Cluster ion beam profiling of organics by secondary ion mass spectrometry - does sodium affect the molecular ion intensity at interfaces?
    Green, Felicia M.
    Gilmore, Ian S.
    Seah, Martin P.
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2008, 22 (24) : 4178 - 4182
  • [34] LIQUID SECONDARY ION MASS-SPECTROMETRY WITH A FOCUSED PRIMARY ION-SOURCE
    STOLL, RG
    HARVAN, DJ
    HASS, JR
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1984, 61 (01): : 71 - 79
  • [35] FOCUSED ION-BEAM GALLIUM IMPLANTATION INTO SILICON
    TAMURA, M
    SHUKURI, S
    MONIWA, M
    DEFAULT, M
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 39 (03): : 183 - 190
  • [36] Charge neutralization using secondary electron shower for shave-off depth profiling by focused ion beam secondary ion mass spectrometry
    Ishizaki, Y.
    Yamamoto, T.
    Fujii, M.
    Owari, M.
    Nojima, M.
    Nihei, Y.
    APPLIED SURFACE SCIENCE, 2008, 255 (04) : 1351 - 1353
  • [37] ION NEUTRALIZATION IN SECONDARY ION MASS-SPECTROMETRY
    GARRETT, RF
    MACDONALD, RJ
    OCONNOR, DJ
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 333 - 335
  • [38] INSTRUMENTAL ASPECTS OF SECONDARY ION MASS-SPECTROMETRY AND SECONDARY ION IMAGING MASS-SPECTROMETRY
    WERNER, HW
    VACUUM, 1972, 22 (11) : 613 - 617
  • [39] Method for improved secondary ion yields in cluster secondary ion mass spectrometry
    Brewer, Tim M.
    Szakal, Christopher
    Gillen, Greg
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2010, 24 (05) : 593 - 598
  • [40] Secondary ion mass spectrometry round-robin study of relative sensitivity factors in gallium arsenide
    Homma, Y
    Tohjou, F
    Masamoto, A
    Shibata, M
    Shichi, H
    Yoshioka, Y
    Adachi, T
    Akai, T
    Gao, Y
    Hirano, M
    Hirano, T
    Ihara, A
    Kamejima, T
    Koyama, H
    Maier, M
    Matsumoto, S
    Matsunaga, H
    Nakamura, T
    Obata, T
    Okuno, K
    Sadayama, S
    Sasa, K
    Sasakawa, K
    Shimanuki, Y
    Suzuki, S
    Sykes, DE
    Tachikawa, I
    Takase, H
    Tanigaki, T
    Tomita, M
    Tosho, H
    Kurosawa, S
    SURFACE AND INTERFACE ANALYSIS, 1998, 26 (02) : 144 - 154
12345