Stable, metastable and charged dangling bonds in transient light-induced ESR of undoped a-Si:H

被引:0
|
作者
Saleh, Zaki M. [1 ]
Tarui, Hisaki [1 ]
Nakamura, Noboru [1 ]
Nishikuni, Masato [1 ]
Tsuda, Shinya [1 ]
Nakano, Shoichi [1 ]
Kuwano, Yukinori [1 ]
机构
[1] Sanyo Electric Co, Ltd, Osaka, Japan
关键词
Amorphous materials;
D O I
暂无
中图分类号
TM23 []; TN304 [材料];
学科分类号
摘要
Transient light-induced electron spin resonance (LESR) at 120 K, has been used to investigate potential differences between intrinsic (stable) and light-induced (metastable) defects in a-Si:H through changes in the line shape. Previously, we have reported that when the line shape is decomposed into broad and narrow components, the narrow component decreases dramatically, relative to the broad component, with increasing light-soaking time. The present results indicate, however, that similar changes are not observed when the defect density is increased by changing deposition conditions or by high-temperature annealing. A dangling-bond-conversion process involving charged dangling bonds is proposed to explain these changes. We suggest that stable and metastable defects play different roles in transient LESR and may occupy different energy positions in the gap of a-Si:H.
引用
收藏
页码:3801 / 3807
相关论文
共 50 条
  • [31] Dispersive processes in the annealing of light- and thermally-induced dangling bonds in a-Si:H
    Takeda, K
    Hikita, H
    Kimura, Y
    Yokomichi, H
    Morigaki, K
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 200 : 486 - 489
  • [32] PULSED-ESR STUDY OF LIGHT-INDUCED METASTABLE DEFECT IN A-SI-H
    YAMASAKI, S
    ISOYA, J
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 164 : 169 - 174
  • [33] Pulsed ESR study of light-induced metastable defects in O-17 and C-13 incorporated a-Si:H
    Yamasaki, S
    Umeda, T
    Isoya, J
    Matsuda, A
    Tanaka, K
    AMORPHOUS SILICON TECHNOLOGY - 1996, 1996, 420 : 587 - 592
  • [34] Metastable Defect Formation at Microvoids Identified as a Source of Light-Induced Degradation in a-Si:H
    Fehr, M.
    Schnegg, A.
    Rech, B.
    Astakhov, O.
    Finger, F.
    Bittl, R.
    Teutloff, C.
    Lips, K.
    PHYSICAL REVIEW LETTERS, 2014, 112 (06)
  • [35] Effect of illumination on the rate of relaxation of light-induced metastable states in a-Si:H(B)
    Kurova, IA
    Ormont, NN
    Gromadin, AL
    SEMICONDUCTORS, 2003, 37 (06) : 727 - 729
  • [36] Are both thermal and light-induced annealing of metastable defects in a-Si:H driven by electrons?
    1600, Elsevier Science B.V., Amsterdam, Netherlands (190): : 1 - 2
  • [37] Effect of illumination on the rate of relaxation of light-induced metastable states in a-Si:H(B)
    I. A. Kurova
    N. N. Ormont
    A. L. Gromadin
    Semiconductors, 2003, 37 : 727 - 729
  • [38] Light-induced effects in a-Si:H(Er)
    Birukov, AV
    Fenuchin, AV
    Kazanskii, AG
    Terukov, EI
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 105 (1-3): : 153 - 156
  • [39] Light-induced anelastic change in a-Si(H)
    Hinuma, T.
    Kasai, H.
    Tanimoto, H.
    Yamanaka, M.
    Sakata, I.
    Mizubayashi, H.
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2006, 442 (1-2): : 302 - 306
  • [40] Light-induced metastable defects in a-Si:H studied by constant photocurrent method at 120 K
    Kodolbas, AO
    Eray, A
    Öktü, Ö
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 255 (2-3) : 132 - 139