Diffusion of 18 elements implanted into thermally grown SiO2

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[1] Francois-Saint-Cyr, H.G.

[2] Stevie, F.A.

[3] McKinley, J.M.

[4] Elshot, K.

[5] Chow, L.

[6] Richardson, K.A.

来源：

Chow, L. (chow@ucf.edu) | 1600年 / American Institute of Physics Inc.卷 / 94期

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