Diffusion of 18 elements implanted into thermally grown SiO2

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[1] Francois-Saint-Cyr, H.G.
[2] Stevie, F.A.
[3] McKinley, J.M.
[4] Elshot, K.
[5] Chow, L.
[6] Richardson, K.A.
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Chow, L. (chow@ucf.edu) | 1600年 / American Institute of Physics Inc.卷 / 94期
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