Kinetic analysis of the growth of polycrystalline silicon from silane, using a rod-substrate CVD reactor

被引：0

作者：

Hashimoto, K. ^{[1
]}

Miura, K. ^{[1
]}

Masuda, T. ^{[1
]}

Toma, M. ^{[1
]}

Sawai, H. ^{[1
]}

Kawase, M. ^{[1
]}

机构：

[1] Kyoto Univ, Kyoto, Japan

来源：

International chemical engineering | 1992年 / 32卷 / 02期

关键词：

Silanes;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：360 / 369

共 39 条

[1] KINETIC-ANALYSIS OF POLYCRYSTALLINE SILICON GROWTH FROM SILANE USING A ROD-SUBSTRATE CVD REACTOR
HASHIMOTO, K
MIURA, K
MASUDA, T
TOMA, M
SAWAI, H
KAWASE, M
KAGAKU KOGAKU RONBUNSHU, 1990, 16 (03) : 438 - 446
[2] THE GROWTH OF SILICON FROM SILANE IN COLD WALL CVD SYSTEMS
CLAASSEN, WAP
BLOEM, J
PHILIPS JOURNAL OF RESEARCH, 1981, 36 (02) : 122 - 137
[3] CFD-PBM coupled simulation of silicon CVD growth in a fluidized bed reactor: Effect of silane pyrolysis kinetic models
Liu, Si-Si
Xiao, Wen-De
CHEMICAL ENGINEERING SCIENCE, 2015, 127 : 84 - 94
[4] CALCULATIONS ON EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR
EVERSTEY.FC
SEVERIN, PJW
VONDERBR.CH
PEEK, HL
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (11) : C377 - &
[5] DESIGN CONDISERATIONS ON EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR
EVERSTEIJN, FC
PEEK, HL
PHILIPS RESEARCH REPORTS, 1970, 25 (06): : 472 - +
[6] Silicon nitride film growth by remote plasma CVD using Tris(dimethylamino)silane
Aoki, T
Ogishima, T
Wróbel, AM
Nakanishi, Y
Hatanaka, Y
VACUUM, 1998, 51 (04) : 747 - 750
[7] INVESTIGATION OF MICROSTRUCTURE AND GRAIN-GROWTH OF POLYCRYSTALLINE SILICON DEPOSITED USING SILANE AND DISILANE
LEE, EG
KIM, JJ
THIN SOLID FILMS, 1993, 226 (01) : 123 - 128
[8] A STAGNANT LAYER MODEL FOR EPITAXIAL GROWTH OF SILICON FROM SILANE IN A HORIZONTAL REACTOR
EVERSTEYN, FC
SEVERIN, PJW
BREKEL, CHJV
PEEK, HL
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) : 925 - +
[9] Growth and analysis of polycrystalline silicon ingots using recycled silicon from waste solar module
Sah, Dheeraj
Chitra
Upadhyay, Naval Kishor
Muthiah, Saravanan
Kumar, Sushil
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2023, 261
[10] CHARACTERIZATION OF POLYCRYSTALLINE SILICON PARTICLES PRODUCED VIA CVD FROM MONOSILANE IN A FLUIDIZED-BED REACTOR
MATSUKATA, M
ODAGIRI, T
KOJIMA, T
JOURNAL DE PHYSIQUE IV, 1991, 1 (C2): : 483 - 490

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