THERMODYNAMIC ANALYSIS OF THE CHEMICAL VAPOR DEPOSITION OF COMPOSITE LT AN BR Si3N4 RT AN BR LT AN BR BN RT AN BR COATINGS.

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作者：
Besmann, T.M. [1 ]
机构：
[1] Oak Ridge Natl Lab, Chemical, Technology Div, Oak Ridge, TN, USA, Oak Ridge Natl Lab, Chemical Technology Div, Oak Ridge, TN, USA
来源：
Journal of the American Ceramic Society | 1986年 / 69卷 / 01期
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页码：69 / 74
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