THERMODYNAMIC ANALYSIS OF THE CHEMICAL VAPOR DEPOSITION OF COMPOSITE LT AN BR Si3N4 RT AN BR LT AN BR BN RT AN BR COATINGS.

被引：0

作者：

Besmann, T.M. ^{[1
]}

机构：

[1] Oak Ridge Natl Lab, Chemical, Technology Div, Oak Ridge, TN, USA, Oak Ridge Natl Lab, Chemical Technology Div, Oak Ridge, TN, USA

来源：

Journal of the American Ceramic Society | 1986年 / 69卷 / 01期

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引用

页码：69 / 74

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