Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolation

被引：0
|
作者：
Yeon, Chung-Kyu [1 ]
You, Hyuk-Joon [1 ]
机构：
[1] ULSI Laboratory, LG Semicon Co., Ltd., 1, Hyangjeong-dong, Cheongju-si 361-480, Korea, Republic of
来源：
| 1998年 / AVS Science and Technology Society卷 / 16期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 47 条
  • [41] Nanopattern profile control technology using reactive ion etching for 100 GB optical disc mastering
    Fujimura, M
    Hosoda, Y
    Katsumura, M
    Kobayashi, M
    Kitahara, H
    Hashimoto, K
    Kasono, O
    Iida, T
    Kuriyama, K
    Yokogawa, F
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (2B): : 1414 - 1418
  • [42] Nanopattern profile control technology using reactive ion etching for 100 GB optical disc mastering
    Fujimura, Megumi
    Hosoda, Yasuo
    Katsumura, Masahiro
    Kobayashi, Masaki
    Kitahara, Hiroaki
    Hashimoto, Kazunobu
    Kasono, Osamu
    Iida, Tetsuya
    Kuriyama, Kazumi
    Yokogawa, Fumihiko
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1600, 45 (2 B): : 1414 - 1418
  • [43] MAGNETRON-ENHANCED REACTIVE ION ETCHING OF GAAS AND ALGAAS USING CH4/H2/AR
    MCLANE, GF
    COLE, MW
    ECKART, DW
    COOKE, P
    MOERKIRK, R
    MEYYAPPAN, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04): : 1753 - 1757
  • [44] Study of shallow trench isolation dry etching process using oxide hard mask and KrF photo-resist in 90 nm stand-alone flash device
    Cho, Eunsang
    Lee, Mingon
    Shin, Dongwon
    hwang, Sangil
    Ryu, Sangwook
    Lee, Kanghyun
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2, 2008, 6923
  • [45] Deep reactive ion etching of silica for planar lightwave circuits using indigenously developed ECR/RIE system
    Pachauri, JP
    Baby, A
    Chaturvedi, N
    Kothari, HS
    Singh, A
    Singh, BR
    Dixit, PN
    Bhattacharya, R
    PHOTONICS 2000: INTERNATIONAL CONFERENCE ON FIBER OPTICS AND PHOTONICS, 2001, 4417 : 267 - 270
  • [46] CHARGE BUILDUP AND UNIFORMITY CONTROL IN MAGNETICALLY ENHANCED REACTIVE ION ETCHING USING A CURVED LATERAL MAGNETIC-FIELD
    NAKAGAWA, S
    SASAKI, T
    MORI, H
    NAMURA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B): : 2194 - 2199
  • [47] Charge build-up and uniformity control in magnetically enhanced reactive ion etching using a curved lateral magnetic field
    Nakagawa, Satoshi, 1600, JJAP, Minato-ku, Japan (33):
12345