首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
Effects of active hydrogen on atomic layer epitaxy of GaAs
被引:0
|
作者
:
Meguro, T.
论文数:
0
引用数:
0
h-index:
0
机构:
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Meguro, T.
[
1
]
Isshiki, H.
论文数:
0
引用数:
0
h-index:
0
机构:
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Isshiki, H.
[
1
]
Lee, J.-S.
论文数:
0
引用数:
0
h-index:
0
机构:
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Lee, J.-S.
[
1
]
Iwai, S.
论文数:
0
引用数:
0
h-index:
0
机构:
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Iwai, S.
[
1
]
Aoyagi, Y.
论文数:
0
引用数:
0
h-index:
0
机构:
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
Aoyagi, Y.
[
1
]
机构
:
[1]
Inst of Physical and Chemical, Research (RIKEN), Saitama, Japan
来源
:
Applied Surface Science
|
1997年
/ 112卷
关键词
:
D O I
:
暂无
中图分类号
:
学科分类号
:
摘要
:
引用
收藏
页码:118 / 121
相关论文
共 50 条
[31]
CRYSTALLOGRAPHIC SELECTIVE GROWTH OF GAAS BY ATOMIC LAYER EPITAXY
ISSHIKI, H
论文数:
0
引用数:
0
h-index:
0
机构:
Frontier Research Program, Institute of Physical and Chemical Research (RIKEN), Wako-shi, Saitama 351-01
ISSHIKI, H
AOYAGI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Frontier Research Program, Institute of Physical and Chemical Research (RIKEN), Wako-shi, Saitama 351-01
AOYAGI, Y
SUGANO, T
论文数:
0
引用数:
0
h-index:
0
机构:
Frontier Research Program, Institute of Physical and Chemical Research (RIKEN), Wako-shi, Saitama 351-01
SUGANO, T
IWAI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Frontier Research Program, Institute of Physical and Chemical Research (RIKEN), Wako-shi, Saitama 351-01
IWAI, S
MEGURO, T
论文数:
0
引用数:
0
h-index:
0
机构:
Frontier Research Program, Institute of Physical and Chemical Research (RIKEN), Wako-shi, Saitama 351-01
MEGURO, T
APPLIED PHYSICS LETTERS,
1993,
63
(11)
: 1528
-
1530
[32]
GAAS/ALGAAS QUANTUM-WELL LASERS WITH ACTIVE REGIONS GROWN BY ATOMIC LAYER EPITAXY
DENBAARS, SP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
DENBAARS, SP
BEYLER, CA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
BEYLER, CA
HARIZ, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
HARIZ, A
DAPKUS, PD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
UNIV SO CALIF,CTR PHOTON TECHNOL,LOS ANGELES,CA 90089
DAPKUS, PD
APPLIED PHYSICS LETTERS,
1987,
51
(19)
: 1530
-
1532
[33]
ATOMIC LAYER EPITAXY OF CDTE ON GAAS, BY ORGANOMETALLIC VAPOR-PHASE EPITAXY
WANG, WS
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
WANG, WS
EHSANI, HE
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
EHSANI, HE
BHAT, IB
论文数:
0
引用数:
0
h-index:
0
机构:
RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
BHAT, IB
JOURNAL OF CRYSTAL GROWTH,
1992,
124
(1-4)
: 670
-
675
[34]
EFFECTS OF SIMULTANEOUS THERMAL PULSE IRRADIATION IN LASER-ATOMIC LAYER EPITAXY OF GAAS
MEGURO, T
论文数:
0
引用数:
0
h-index:
0
机构:
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
MEGURO, T
IWAI, S
论文数:
0
引用数:
0
h-index:
0
机构:
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
IWAI, S
AOYAGI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
AOYAGI, Y
SUZUKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
SUZUKI, T
HIRATA, A
论文数:
0
引用数:
0
h-index:
0
机构:
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
WASEDA UNIV,SCH SCI & ENGN,TOKYO 169,JAPAN
HIRATA, A
KAGAKU KOGAKU RONBUNSHU,
1990,
16
(03)
: 620
-
623
[35]
KINETICS AND MECHANISM OF ATOMIC LAYER EPITAXY OF GAAS USING TRIMETHYLGALLIUM
OHNO, H
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN
OHNO, H
GOTO, S
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN
GOTO, S
NOMURA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN
NOMURA, Y
MORISHITA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN
MORISHITA, Y
KATAYAMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN
KATAYAMA, Y
APPLIED SURFACE SCIENCE,
1994,
82-3
: 164
-
170
[36]
ROLE OF A METALORGANIC AS SOURCE IN ATOMIC LAYER EPITAXY OF GAAS AND ALAS
SUEMUNE, I
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute for Electronic Science, Hokkaido University, Kita-ku, Sapporo, 060, Kita-12
SUEMUNE, I
APPLIED SURFACE SCIENCE,
1994,
82-3
: 149
-
157
[37]
THE SURFACE-CHEMISTRY AND KINETICS OF GAAS ATOMIC LAYER EPITAXY
CREIGHTON, JR
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Division 1126, Albuquerque
CREIGHTON, JR
BANSENAUER, BA
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Division 1126, Albuquerque
BANSENAUER, BA
THIN SOLID FILMS,
1993,
225
(1-2)
: 17
-
25
[38]
SURFACE-REACTION MECHANISMS IN GAAS ATOMIC LAYER EPITAXY
MASHITA, M
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Toshiba Corp., Saiwai-ku, Kawasaki, 210, 1, Komukai Toshiba-cho
MASHITA, M
SASAKI, M
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Toshiba Corp., Saiwai-ku, Kawasaki, 210, 1, Komukai Toshiba-cho
SASAKI, M
KAWAKYU, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Toshiba Corp., Saiwai-ku, Kawasaki, 210, 1, Komukai Toshiba-cho
KAWAKYU, Y
ISHIKAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
Research and Development Center, Toshiba Corp., Saiwai-ku, Kawasaki, 210, 1, Komukai Toshiba-cho
ISHIKAWA, H
JOURNAL OF CRYSTAL GROWTH,
1993,
131
(1-2)
: 61
-
70
[39]
Atomic layer epitaxy of GaAs using GaBr and GaI sources
Taki, Tetsuya
论文数:
0
引用数:
0
h-index:
0
机构:
Tokyo Univ of Agriculture and, Technology, Tokyo, Japan
Tokyo Univ of Agriculture and, Technology, Tokyo, Japan
Taki, Tetsuya
Koukitu, Akinori
论文数:
0
引用数:
0
h-index:
0
机构:
Tokyo Univ of Agriculture and, Technology, Tokyo, Japan
Tokyo Univ of Agriculture and, Technology, Tokyo, Japan
Koukitu, Akinori
Applied Surface Science,
1997,
112
: 127
-
131
[40]
SELF-LIMITING MECHANISM IN THE ATOMIC LAYER EPITAXY OF GAAS
TISCHLER, MA
论文数:
0
引用数:
0
h-index:
0
TISCHLER, MA
BEDAIR, SM
论文数:
0
引用数:
0
h-index:
0
BEDAIR, SM
APPLIED PHYSICS LETTERS,
1986,
48
(24)
: 1681
-
1683
←
1
2
3
4
5
→