共 50 条
- [22] STRUCTURAL-PROPERTIES OF SILICON-OXIDE FILMS PREPARED BY THE RF SUBSTRATE BIASED ECR PLASMA CVD METHOD JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (06): : L1048 - L1050
- [23] High rate growth of preferentially orientated crystalline silicon films by ECR plasma CVD PROCEEDINGS OF 3RD WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION, VOLS A-C, 2003, : 1651 - 1654
- [25] Silicon carbon nitride films deposited by ECR CVD PROCEEDINGS OF THE STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXX), 1999, 99 (04): : 13 - 24