Optimum TiSi2 ohmic contact process for sub-100 nm devices

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[1] Park, Hee Sook
[2] Lee, Jong Myeong
[3] Lee, Sang Woo
[4] Park, Jea Hwa
[5] Moon, Kwang Jin
[6] Kang, Sang Bom
[7] Choi, Gil Heyun
[8] Chung, U. In
[9] Moon, Joo Tae
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Park, H.S. (jumma@samsung.com) | 1804年 / Japan Society of Applied Physics卷 / 43期
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