SIMS analysis of migration characteristics of fluorine in BF2+ implanted polysilicon gate with different implantation doses

被引：0
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作者：
Zhang, Tingqing [1 ]
Liu, Jialu [1 ]
Li, Jianjun [1 ]
Sun, Yongming [1 ]
Zhao, Yuanfu [1 ]
机构：
[1] Xi'an Univ of Electronic Science and, Technology, Xi'an, China
来源：
Weixi Jiagong Jishu/Microfabrication Technology | 1998年 / 04期
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摘要：
3
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页码：43 / 46
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