Er/O and Er/F doping during molecular beam epitaxial growth of Si layers for efficient 1.54 μm light emission

被引:0
|
作者
Ni, W.-X.
Joelsson, K.B.
Du, C.-X.
Buyanova, I.A.
Pozina, G.
Chen, W.M.
Hansson, G.V.
Monemar, B.
Cardenas, J.
Svensson, B.G.
机构
来源
Applied Physics Letters | 1997年 / 70卷 / 25期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] Epitaxial Growth of Si(111)/Er2O3 (111) Structure on Si(111) by Molecular Beam Epitaxy
    Xu Run
    Tang Min-Yan
    Zhu Yan-Yan
    Wang Lin-Jun
    CHINESE PHYSICS LETTERS, 2011, 28 (03)
  • [22] 1.54 MU-M WAVELENGTH EMISSION OF HIGHLY ER-DOPED CAF2 LAYERS GROWN BY MOLECULAR-BEAM EPITAXY
    DARAN, E
    LEGROS, R
    MUNOZYAGUE, A
    FONTAINE, C
    BAUSA, LE
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (01) : 270 - 273
  • [23] Effect of O:Er concentration ratio on the structural, electrical, and optical properties of Si:Er:O layers grown by molecular beam epitaxy
    Scalese, S
    Franzò, G
    Mirabella, S
    Re, M
    Terrasi, A
    Priolo, F
    Rimini, E
    Spinella, C
    Carnera, A
    JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) : 4091 - 4096
  • [24] EFFECT OF GROWTH TEMPERATURE AND DOPING CONCENTRATION ON THE DISTRIBUTION OF THE EMITTING CENTERS IN CAF2-ER MOLECULAR-BEAM EPITAXIAL LAYERS
    DARAN, E
    LEGROS, R
    MUNOZYAGUE, A
    FONTAINE, C
    BAUSA, LE
    JOURNAL OF APPLIED PHYSICS, 1994, 75 (06) : 2749 - 2752
  • [25] 1.54 μm Emission of pulsed-laser deposited Er-doped films on Si
    Lanzerstorfer, S
    Pedarnig, JD
    Gunasekaran, RA
    Bäuerle, D
    Jantsch, W
    JOURNAL OF LUMINESCENCE, 1998, 80 (1-4) : 353 - 356
  • [26] 1.54 μm emission of pulsed-laser deposited Er-doped films on Si
    Lanzerstorfer, S
    Pedarnig, JD
    Gunasekaran, RA
    Bäuerle, D
    Jantsch, W
    LIGHT EMISSION FROM SILICON: PROGRESS TOWARDS SI-BASED OPTOELECTRONICS, 1999, 77 : 353 - 356
  • [27] Er doping of III-nitrides during growth by metalorganic molecular beam epitaxy
    Univ of Florida, Gainesville, United States
    J Cryst Growth, pt 1 (84-88):
  • [28] Er doping of III-nitrides during growth by metalorganic molecular beam epitaxy
    MacKenzie, JD
    Abernathy, CR
    Pearton, SJ
    Hommerich, U
    Wu, X
    Schwartz, RN
    Wilson, RG
    Zavada, JM
    JOURNAL OF CRYSTAL GROWTH, 1997, 175 : 84 - 88
  • [29] Si:Er:O layers grown by molecular beam epitaxy:: structural, electrical and optical properties
    Scalese, S
    Franzò, G
    Mirabella, S
    Re, M
    Terrasi, A
    Priolo, F
    Rimini, E
    Camera, A
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2001, 81 (1-3): : 62 - 66
  • [30] Efficient 1.53 μm emission and energy transfer in Si/Er-Si-O multilayer structure
    Zheng, J.
    Zuo, Y. H.
    Wang, W.
    Tao, Y. L.
    Xue, C. L.
    Cheng, B. W.
    Wang, Q. M.
    MATERIALS RESEARCH BULLETIN, 2011, 46 (02) : 262 - 265