ELECTROMIGRATION LIFETIME STUDIES OF SUBMICROMETER-LINEWIDTH Al-Cu CONDUCTORS.

被引：0

作者：

Iyer, Subramanian S. ^{[1
]}

Ting, Chung-Yu ^{[1
]}

机构：

[1] IBM, Thomas J. Watson Research Cent,, Yorktown Heights, NY, USA, IBM, Thomas J. Watson Research Cent, Yorktown Heights, NY, USA

来源：

IEEE Transactions on Electron Devices | 1984年 / ED-31卷 / 10期

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摘要：

引用

页码：1468 / 1471

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