ELECTROMIGRATION LIFETIME STUDIES OF SUBMICROMETER-LINEWIDTH Al-Cu CONDUCTORS.

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作者：
Iyer, Subramanian S. [1 ]
Ting, Chung-Yu [1 ]
机构：
[1] IBM, Thomas J. Watson Research Cent,, Yorktown Heights, NY, USA, IBM, Thomas J. Watson Research Cent, Yorktown Heights, NY, USA
来源：
IEEE Transactions on Electron Devices | 1984年 / ED-31卷 / 10期
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页码：1468 / 1471
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